On-wafer I/V measurement setup for the characterization of low-frequency dispersion in electron devices

Raffo, A. ; Santarelli, A. ; Traverso, P.A. ; Vannini, G. ; Filicori, F. (2004) On-wafer I/V measurement setup for the characterization of low-frequency dispersion in electron devices. In: 63rd ARFTG Conference Digest Spring, 2004, 11 giugno 2004, Fort Worth, Texas.
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Abstract

Large-signal dynamic modelling of 111-V FETs cannot he simply based on DC i/v characteristics, when accurate performance prediction is needed. In fact, dispersive phenomena due to self-heating and/or traps (surface state densities and deep level traps) must be taken into account since they cause important deviations in the low-frequency dynamic drain current. Thus, static drain current characteristics should he replaced with a suitable model which also accounts for low-frequency dispersive effects. The research community has proposed different modelling approaches and quite often a characterisation by means of pulsed i/v measurement systems has been suggested as the more appropriate for the identification of lowfrequency drain current models. In the paper, a new largesignal measurement setup is presented which is based on simple low-frequency sinusoidal excitations and it is easily reproducible with conventional general-purpose lab instrumentation. Moreover, the proposed setup is adopted in the paper to extract a hackgating-like model for dispersive phenomena

Abstract
Document type
Conference or Workshop Item (Paper)
Creators
CreatorsAffiliationORCID
Raffo, A.
Santarelli, A.
Traverso, P.A.
Vannini, G.
Filicori, F.
Keywords
field effect transistors, semiconductor device characterisation, large-signal modeling, dispersive phenomena
Subjects
DOI
Deposit date
07 Apr 2006
Last modified
16 May 2011 12:02
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