Dielectric Material Impact on Capacitive RF MEMS Reliability

Lisec, T. ; Huth, C. ; Wagner, B. (2004) Dielectric Material Impact on Capacitive RF MEMS Reliability. In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, Amsterdam.
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Abstract

The influence of different types of dielectrics on the switching behaviour and reliability of capacitive RF MEMS switches fabricated by metal surfacemicromachining is investigated. Sputtered AlN layers are compared to PECVD Si3N4 and Ta2O5 layers. It has been found that switches with sputtered AlN can be operated without failure in a wide range of driving conditions. Besides the dielectric charging problem another degradation has been observed independent of the dielectric material. The effect only occurs for operation in ambient air and is probably caused by an electrochemical reaction.

Abstract
Document type
Conference or Workshop Item (Paper)
Creators
CreatorsAffiliationORCID
Lisec, T.
Huth, C.
Wagner, B.
Subjects
DOI
Deposit date
16 Jun 2005
Last modified
17 Feb 2016 14:16
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