Meng, C.C. ; Chen, J. W. ; Chang, C.H. ; Chen, L.P. ; Lee, H.Y. ; Kuan, J.F.
(2000)
Using Average RF Gate and Drain Currents to Determine Gain Compression Mechanisms for Narrow-recessed and Wide-recessed MESFETs.
In: Gallium Arsenide applications symposium. GAAS 2000, 2-6 october 2000, Paris.
Full text available as:
Abstract
Knee voltage, pinch-off voltage, breakdown voltage and maximum rf drain current clip output I-V waveform of a MESFET and cause gain compression and power saturation. Thus, verage rf gate and drain currents can be used to determine gain compression mechanisms for MESFETs. There is a distinct signature in average rf gate and drain currents for each gain compression mechanism. Narrow recess and wide recess MESFET exhibits different average rf gate and drain current behavior when a device is biased toward maximum drain current. The average rf drain current decreases for a wide-recessed MESFET when the device is biased toward maximum drain current and tuned for maximum output power.
Abstract
Knee voltage, pinch-off voltage, breakdown voltage and maximum rf drain current clip output I-V waveform of a MESFET and cause gain compression and power saturation. Thus, verage rf gate and drain currents can be used to determine gain compression mechanisms for MESFETs. There is a distinct signature in average rf gate and drain currents for each gain compression mechanism. Narrow recess and wide recess MESFET exhibits different average rf gate and drain current behavior when a device is biased toward maximum drain current. The average rf drain current decreases for a wide-recessed MESFET when the device is biased toward maximum drain current and tuned for maximum output power.
Document type
Conference or Workshop Item
(Paper)
Creators
Subjects
DOI
Deposit date
17 Jun 2004
Last modified
17 Feb 2016 13:41
URI
Other metadata
Document type
Conference or Workshop Item
(Paper)
Creators
Subjects
DOI
Deposit date
17 Jun 2004
Last modified
17 Feb 2016 13:41
URI
Downloads
Downloads
Staff only: