New Probing Technology Now Enables Impedance controlled On-Wafer Probing

Wollitzer, M. ; Thies, S. ; Schott, S. (2001) New Probing Technology Now Enables Impedance controlled On-Wafer Probing. In: Gallium Arsenide applications symposium. GAAS 2001, 24-28 september 2001, London.
Full text available as:
[thumbnail of Eug_p140.pdf]
Preview
PDF
Download (953kB) | Preview

Abstract

The development of coaxial and planar RF measurement systems demands a completely different approach as currently used in the low frequency field. In order to achieve minimum reflections in an RF cable, a defined wave resistance must be kept up along its whole length. It is therefore of primary importance to choose appropriate manufacturing techniques, in this case micromachining, after a thorough analysis of all possibilities for HF transmission. We will show that applying these principles to the tips used to contact planar circuits results in the smallest possible impairment to the signals to be transferred.

Abstract
Document type
Conference or Workshop Item (Poster)
Creators
CreatorsAffiliationORCID
Wollitzer, M.
Thies, S.
Schott, S.
Subjects
DOI
Deposit date
17 Jun 2004
Last modified
17 Feb 2016 13:49
URI

Other metadata

Downloads

Downloads

Staff only: View the document

^