Vertical Silicon K-Band CPW Through-Wafer Interconnects

Reimann, M. ; Ulm, M. ; Buck, T. ; Müller-Fiedler, R. ; Heinrich, W. (2002) Vertical Silicon K-Band CPW Through-Wafer Interconnects. In: Gallium Arsenide applications symposium. GAAS 2002, 23-27 september 2002, Milano.
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Abstract

With the increase in production volume of RF devices (e.g. for automotive applications), packaging and interconnection become more and more important. Furthermore, new system concepts such as chip-on-chip or RF- MEMS demand new packaging strategies. This paper presents a vertical silicon micromachined RF CPW through- wafer feedthrough with excellent performance in the K-band. In particular, the feedthrough demonstrates an insertion loss of 0.16dB and a return loss of 20dB at 25GHz. A lumped element model was developed and was evaluated with measurements.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Reimann, M.
Ulm, M.
Buck, T.
Müller-Fiedler, R.
Heinrich, W.
Settori scientifico-disciplinari
DOI
Data di deposito
17 Giu 2004
Ultima modifica
17 Feb 2016 13:50
URI

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