Carbon Doped InP/InGaAs Heterojunction Bipolar Transistors Grown By MOCVD

Deluca, P.M. ; Landini, B.E. ; Welser, R. E. (2001) Carbon Doped InP/InGaAs Heterojunction Bipolar Transistors Grown By MOCVD. In: Gallium Arsenide applications symposium. Gaas 2001, 24-28 September 2001, London.
Full text available as:
[thumbnail of G_2_1.pdf]
Preview
PDF
Download (186kB) | Preview

Abstract

InGaAs/InP heterojunction bipolar transistors grown in a multi-wafer metal-organic chemicalvapor deposition system will be demonstrated.Excellent large and small area DC and RF results are obtained for single and double heterojunction structures. The large area DC current gain was increased by a factor of 3 at a given base sheet resistance via growth optimization. DHBT devices exhibit a current gain cut-off frequency of ft ~ 125 GHz and a unilateral gain cut-off frequency of fmax ~ 125 GHz.

Abstract
Document type
Conference or Workshop Item (Paper)
Creators
CreatorsAffiliationORCID
Deluca, P.M.
Landini, B.E.
Welser, R. E.
Subjects
DOI
Deposit date
17 Jun 2004
Last modified
17 Feb 2016 13:33
URI

Other metadata

Downloads

Downloads

Staff only: View the document

^