Analysis of Sensitivity for Low-Pass Multilayer Optical Filters

Massaro, A. ; Pierantoni, L. ; Ciandrini, C. ; Rozzi, T. (2005) Analysis of Sensitivity for Low-Pass Multilayer Optical Filters. In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, 2004, Amsterdam.
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Abstract

Integrated optical and millimetric circuits produced by standard thin film-based technology suffer from manufacturing imperfections resulting in degradation of the absorption/diffraction response. Deposition through rf-bias sputtering is of particular interest in order to design an optical multilayered (Si and SiO2) filter. Geometrical imperfections like roughness at layer boundaries however gradually increase with the number of deposited layers. The low-pass filter specifications present high sensitivity to the errors of the exact values of ideal thickness and of ideal refractive indices. In this contribution, we evaluate the sensitivity of the specifications with respect to deviation from the exact values of refractive indices and thicknesses.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Massaro, A.
Pierantoni, L.
Ciandrini, C.
Rozzi, T.
Settori scientifico-disciplinari
DOI
Data di deposito
21 Ott 2005
Ultima modifica
16 Mag 2011 11:38
URI

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