Massaro, A. ; Pierantoni, L. ; Ciandrini, C. ; Rozzi, T.
(2005)
Analysis of Sensitivity for Low-Pass Multilayer Optical Filters.
In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, 2004, Amsterdam.
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Abstract
Integrated optical and millimetric circuits produced by standard thin film-based technology suffer from manufacturing imperfections resulting in degradation of the absorption/diffraction response. Deposition through rf-bias sputtering is of particular interest in order to design an optical multilayered (Si and SiO2) filter. Geometrical imperfections like roughness at layer boundaries however gradually increase with the number of deposited layers. The low-pass filter specifications present high sensitivity to the errors of the exact values of ideal thickness and of ideal refractive indices. In this contribution, we evaluate the sensitivity of the specifications with respect to deviation from the exact values of refractive indices and thicknesses.
Abstract
Integrated optical and millimetric circuits produced by standard thin film-based technology suffer from manufacturing imperfections resulting in degradation of the absorption/diffraction response. Deposition through rf-bias sputtering is of particular interest in order to design an optical multilayered (Si and SiO2) filter. Geometrical imperfections like roughness at layer boundaries however gradually increase with the number of deposited layers. The low-pass filter specifications present high sensitivity to the errors of the exact values of ideal thickness and of ideal refractive indices. In this contribution, we evaluate the sensitivity of the specifications with respect to deviation from the exact values of refractive indices and thicknesses.
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Conference or Workshop Item
(Paper)
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DOI
Deposit date
21 Oct 2005
Last modified
16 May 2011 11:38
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Document type
Conference or Workshop Item
(Paper)
Creators
Subjects
DOI
Deposit date
21 Oct 2005
Last modified
16 May 2011 11:38
URI
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