Process technology evaluation for high yield reproducible HEMT/PM-HEMT MMIC fabrication

Cetronio, A. ; Ciceroni, S. ; Graffitti, R. ; Lanzieri, C. ; Peroni, M. (1992) Process technology evaluation for high yield reproducible HEMT/PM-HEMT MMIC fabrication. In: Gallium Arsenide Applications Symposium. GAAS 1992, 27-29 April 1992, Noordwijk, The Netherlands.
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Abstract

In this article we will report on a high yield HEMT/PM-HEMT technology, based an optimised ohmic contact formation and gate recessing. With this technology active device fabrication yields are better than 90% and corresponding key parameter tollerances always better than ± 5%, as required for high yield MMIC fabrication.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Cetronio, A.
Ciceroni, S.
Graffitti, R.
Lanzieri, C.
Peroni, M.
Settori scientifico-disciplinari
DOI
Data di deposito
17 Feb 2006
Ultima modifica
17 Feb 2016 14:45
URI

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