Experimental and numerical study of the hot electron degradation of power AlGaAs/GaAs HFETs

Sozzi, G. ; Dieci, D. ; Menozzi, R. ; Lanzieri, C. ; Tomasi, T. ; Canali, C. (1999) Experimental and numerical study of the hot electron degradation of power AlGaAs/GaAs HFETs. In: Gallium Arsenide Applications Symposium. GAAS 1999, 4-5 October 1999, Bologna, Italy.
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Abstract

This work investigates, through the use of numerical drift-diffusion simulations, the hot electron degradation mechanisms of power AlGaAs/GaAs HFETs. The experimentally observed degradation modes can be consistently explained by a negative charge storage at the device surface over the gate-drain access region.

Abstract
Document type
Conference or Workshop Item (Paper)
Creators
CreatorsAffiliationORCID
Sozzi, G.
Dieci, D.
Menozzi, R.
Lanzieri, C.
Tomasi, T.
Canali, C.
Subjects
DOI
Deposit date
15 Feb 2006
Last modified
17 Feb 2016 14:27
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