Sozzi, G. ; Dieci, D. ; Menozzi, R. ; Lanzieri, C. ; Tomasi, T. ; Canali, C.
(1999)
Experimental and numerical study of the hot electron degradation of power AlGaAs/GaAs HFETs.
In: Gallium Arsenide Applications Symposium. GAAS 1999, 4-5 October 1999, Bologna, Italy.
Full text disponibile come:
Anteprima |
Documento PDF
Download (2MB) | Anteprima |
Abstract
This work investigates, through the use of numerical drift-diffusion simulations, the hot electron degradation mechanisms of power AlGaAs/GaAs HFETs. The experimentally observed degradation modes can be consistently explained by a negative charge storage at the device surface over the gate-drain access region.
Abstract