Enhancing the Device Performance of III-V Based Bipolar Transistors

Lutz, C.R. ; Deluca, P.M. ; Stevens, K.S. ; Landini, B.E. ; Welser, R.E. ; Welty, R.J. ; Asbeck, P.M. (2002) Enhancing the Device Performance of III-V Based Bipolar Transistors. In: Gallium Arsenide applications symposium. GAAS 2002, 23-27 september 2002, Milano.
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Abstract

Superior DC and RF performance are obtained using InGaP/GaInAsN and InP/GaInAs double heterojunction bipolar transistors with compositionally graded base layers. By grading the base layer energy band-gap, we achieve nearly a 100% improvement in DC current gain and as much as a 15% increase in the unity gain cutoff frequency (ft) relative to baseline constant-composition base layer devices. In InGaP/GaInAsN DHBTs, DC current gains as high as 250 and cutoff frequencies of 60 GHz are demonstrated for devices with a collector thickness of 400 nm and BVceo values of 8.4 Volts. Graded-base InP/InGaAs DHBTs with an ft of 135 GHz are also demonstrated. Estimations of the ft*BVceo figure-of-merit are used to compare performance of these devices to existing technologies.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Lutz, C.R.
Deluca, P.M.
Stevens, K.S.
Landini, B.E.
Welser, R.E.
Welty, R.J.
Asbeck, P.M.
Settori scientifico-disciplinari
DOI
Data di deposito
17 Giu 2004
Ultima modifica
17 Feb 2016 13:36
URI

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