GaN Technology Overview: Accomplishments and Challenges

Saunier, Paul (2004) GaN Technology Overview: Accomplishments and Challenges. In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, Amsterdam.
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Abstract

This paper reports the (published) status of the AlGaN/GaN technology in the United States. Activities can be divided between AlGaN/GaN on SiC substrates for military applications, sponsored by DoD and AlGaN/GaN on Si for Base Stations. No doubt that early emphasis for US DoD has been “performances” (the W/mm race!) and progress has been fast, probably culminating with UCSB and Cree demonstrating 32W/mm at 4 GHz. These excellent performances have been made possible by the introduction and refinement of the “Field- Plate”. Understandably, the emphasis is now reliability, and all the challenges have not been conquered. In the commercial world, Nitronex has been pionneering AlGaN/GaN on Si, manufacturing large gate width devices using MOCVD grown 4” Si substrates; 20W at –39dBc is achieved with 11.5dB gain and 25% pae (28V bias) over 1.8-2.2GHz. Excellent reliability is extracted with over 20 years MTTF. TriQuint has demonstrated the potential of GaN on Si for higher frequencies with 7W/mm with 38% pae and 9dB gain at 10GHz.

Abstract
Document type
Conference or Workshop Item (Paper)
Creators
CreatorsAffiliationORCID
Saunier, Paul
Subjects
DOI
Deposit date
16 Jun 2005
Last modified
17 Feb 2016 14:16
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