Large volume production of large size GaAs substrates and epitaxial wafers for microwave devices

Otoki, Y. ; Kamogawa, H. ; Ohnishi, M. ; Inada, T. ; Kashiwa, M. ; Sakaguchi, H. (1999) Large volume production of large size GaAs substrates and epitaxial wafers for microwave devices. In: Gallium Arsenide Applications Symposium. GAAS 1999, 4-5 October 1999, Bologna, Italy.
Full text disponibile come:
[thumbnail of GAAS_99_064.pdf]
Anteprima
Documento PDF
Download (2MB) | Anteprima

Abstract

Recent mass production techniques for LEC substrates and MOVPE wafers for microwave devices are described. Huge GaAs semi-insulating ingots (150mm diam., 310mm long) was obtained by Multi-hot-zone very large size pullar. Three step boule annealing and fully-automated process enabled mass production of the large size substrates. Epitaxiial wafers with abrupt hetero interface, excellent uniformity and reproducibility are producing largely by face down horizontal flow type MOVPE system, which can be applied to 150mm diam..

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Otoki, Y.
Kamogawa, H.
Ohnishi, M.
Inada, T.
Kashiwa, M.
Sakaguchi, H.
Settori scientifico-disciplinari
DOI
Data di deposito
12 Dic 2005
Ultima modifica
17 Feb 2016 14:28
URI

Altri metadati

Statistica sui download

Statistica sui download

Gestione del documento: Visualizza il documento

^