Large volume production of large size GaAs substrates and epitaxial wafers for microwave devices

Otoki, Y. ; Kamogawa, H. ; Ohnishi, M. ; Inada, T. ; Kashiwa, M. ; Sakaguchi, H. (1999) Large volume production of large size GaAs substrates and epitaxial wafers for microwave devices. In: Gallium Arsenide Applications Symposium. GAAS 1999, 4-5 October 1999, Bologna, Italy.
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Abstract

Recent mass production techniques for LEC substrates and MOVPE wafers for microwave devices are described. Huge GaAs semi-insulating ingots (150mm diam., 310mm long) was obtained by Multi-hot-zone very large size pullar. Three step boule annealing and fully-automated process enabled mass production of the large size substrates. Epitaxiial wafers with abrupt hetero interface, excellent uniformity and reproducibility are producing largely by face down horizontal flow type MOVPE system, which can be applied to 150mm diam..

Abstract
Document type
Conference or Workshop Item (Paper)
Creators
CreatorsAffiliationORCID
Otoki, Y.
Kamogawa, H.
Ohnishi, M.
Inada, T.
Kashiwa, M.
Sakaguchi, H.
Subjects
DOI
Deposit date
12 Dec 2005
Last modified
17 Feb 2016 14:28
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