Development of complete on-wafer cryogenic characterization: S-parameter, noise-parameter and load-pull

Laskar, J. ; Murti, M.R. ; Yoo, S.Y. ; Gebara, E. ; Harris, H.M. (1998) Development of complete on-wafer cryogenic characterization: S-parameter, noise-parameter and load-pull. In: Gallium Arsenide Applications Symposium. GAAS 1998, 5-6 October 1998, Amsterdam, The Netherlands.
Full text disponibile come:
[thumbnail of GAAS_98_007.pdf]
Anteprima
Documento PDF
Download (1MB) | Anteprima

Abstract

In this paper, we review recent progress at Georgia Tech's Microwave Application Group towards the development of complete cryogenic analysis techniques. This includes development of on-wafer cryogenic (I5K to 300K) S-parameter, Noise Parameter, and Load-Pull measurement techniques. These data are then used for detailed analysis of various device technologies for development of improved small and large signal models. Applications include optimization of transistor device technology for reduced temperature operation, development of cryogenic low-noise amplifiers, and reduced temperature power amplifier operation.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Laskar, J.
Murti, M.R.
Yoo, S.Y.
Gebara, E.
Harris, H.M.
Settori scientifico-disciplinari
DOI
Data di deposito
16 Feb 2006
Ultima modifica
17 Feb 2016 14:31
URI

Altri metadati

Statistica sui download

Statistica sui download

Gestione del documento: Visualizza il documento

^