Automatic design of GaAs MESFETs for thermal effect optimization

Giorgio, A. ; Perri, A. G. ; Castagnolo, B. (1996) Automatic design of GaAs MESFETs for thermal effect optimization. In: Gallium Arsenide Applications Symposium. GAAS 1996, 5-6 June 1996, Paris, France.
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Abstract

In this paper it is proposed an automatic procedure to extract optimal layout parameters in order to thermal effect minimization, for a MESFET with conventional structure, according to other design specifications. These parameters are the gate length, the gate width, the number of gates, the gate to gate spacing, the die thickness and the heat sink temperature. The procedure accounts for the dependence of the thermal conductivity of gallium arsenide on temperature and doping density. Moreover the proposed procedure, joined with an I-V and a C-V MESFET thermal model already proposed by the authors is a part of a CAD tool for GaAs I.Cs. design for thermal effect optimization.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Giorgio, A.
Perri, A. G.
Castagnolo, B.
Settori scientifico-disciplinari
DOI
Data di deposito
16 Feb 2006
Ultima modifica
17 Feb 2016 14:37
URI

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