Are We There Yet ? – A Metamorphic HEMT and HBT Perspective

Ing Ng, Geok ; Radhakrishnan, K. ; Wang, Hong (2005) Are We There Yet ? – A Metamorphic HEMT and HBT Perspective. In: Gallium Arsenide applications symposium. GAAS 2005, 3-7 ottobre 2005, Parigi.
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Abstract

Metamorphic epitaxy technique offers the possibility of combining the advantages of low-cost and manufacturability of GaAs substrates and the high performance of InP-based devices. This paper will present the recent development of metamorphic HEMTs and HBTs and discuss their readiness for commercialization.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Ing Ng, Geok
Radhakrishnan, K.
Wang, Hong
Settori scientifico-disciplinari
DOI
Data di deposito
16 Feb 2006
Ultima modifica
17 Feb 2016 14:39
URI

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