Microwave Integrated CMOS Oscillators on Silicon-on-insulator Substrate

Goffioul, M. ; Raskin, J.-P. ; Vanhoenacker-Janvier, D. (2000) Microwave Integrated CMOS Oscillators on Silicon-on-insulator Substrate. In: Gallium Arsenide applications symposium. GAAS 2000, 2-6 october 2000, Paris.
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Abstract

This paper shows the feasibility of implementing CMOS microwave oscillators on Silicon-on-Insulator (SOI) substrate at 5.8 and 12 GHz. The oscillators have been designed by introducing in a circuit simulator (SPICE) the SOI MOSFET’s models developed at our laboratory. The models and the fabrication process of 0.25 µm channel length Fully Depleted (FD) SOI MOSFET’s were not yet optimized for the first oscillator designs presented in this paper. However, the results show the potentiality of SOI CMOS technology for building low-power, low-voltage RF circuits.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Poster)
Autori
AutoreAffiliazioneORCID
Goffioul, M.
Raskin, J.-P.
Vanhoenacker-Janvier, D.
Settori scientifico-disciplinari
DOI
Data di deposito
17 Giu 2004
Ultima modifica
17 Feb 2016 13:45
URI

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