Experimental and numerical study of the hot electron degradation of power AlGaAs/GaAs HFETs

Sozzi, G. ; Dieci, D. ; Menozzi, R. ; Lanzieri, C. ; Tomasi, T. ; Canali, C. (1999) Experimental and numerical study of the hot electron degradation of power AlGaAs/GaAs HFETs. In: Gallium Arsenide Applications Symposium. GAAS 1999, 4-5 October 1999, Bologna, Italy.
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Abstract

This work investigates, through the use of numerical drift-diffusion simulations, the hot electron degradation mechanisms of power AlGaAs/GaAs HFETs. The experimentally observed degradation modes can be consistently explained by a negative charge storage at the device surface over the gate-drain access region.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Sozzi, G.
Dieci, D.
Menozzi, R.
Lanzieri, C.
Tomasi, T.
Canali, C.
Settori scientifico-disciplinari
DOI
Data di deposito
15 Feb 2006
Ultima modifica
17 Feb 2016 14:27
URI

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