High-Performance CMOS-Compatible Micromachined Edge-Suspended Coplanar Waveguides on Low- Resistivity Silicon Substrate

Leung, Lydia L. W. ; Zhang, Jinwen ; Hon, Wai Cheong ; Chen, Kevin J. (2004) High-Performance CMOS-Compatible Micromachined Edge-Suspended Coplanar Waveguides on Low- Resistivity Silicon Substrate. In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, Amsterdam.
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Abstract

This paper reports a novel low-loss CMOScompatible coplanar waveguide (CPW) structure based on the micromachined edge-suspension of the signal line. It is revealed that, at radio or microwave frequencies, the current is highly concentrated along the edges of the signal line. Since the coupling to the low resistivity silicon substrate is dominated by the current carrying part, the substrate coupling and loss can be effectively suppressed by removing the silicon along and underneath the edges of the signal lines. The edge-suspended structure has been implemented by a combination of deep reactive ion etching and anisotropic wet etching. The suspended structure shows much reduced loss (0.5 dB/mm at 39 GHz) and strong mechanical strength that is provided by the silicon underneath the center of the signal line.

Abstract
Tipologia del documento
Documento relativo ad un convegno o altro evento (Atto)
Autori
AutoreAffiliazioneORCID
Leung, Lydia L. W.
Zhang, Jinwen
Hon, Wai Cheong
Chen, Kevin J.
Settori scientifico-disciplinari
DOI
Data di deposito
15 Giu 2005
Ultima modifica
17 Feb 2016 14:09
URI

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